XPS measurement of the SiC/AlN band-offset at the (0001) interface

Contributors:   S.W. King, M.C. Benjamin, Robert J. Nemanich, R.F. Davis, and W.R.L. Lambrecht

ABSTRACT

X-ray photoelectron spectroscopy is used to determine the band-offset at the SiC/AlN (0001) interface. First, the valence band spectra are determined for bulk materials and analyzed with the help of calculated densities of states. Core levels are then measured across the interface for a thin film of 2H-AlN on 6H-SiC and allow us to extract a band offset of 1.4 ±0.3 eV. The analysis of the discrepancies between measured peak positions and densities of states obtained within the local density approximation provides information on self-energy corrections in good agreement with independent calculations of the latter.

Publisher: Materials Research Society Symposium Proceedings,   Volume: 395,   375-380 ||  Published: 1996-01 ||   Read more...