Characterization of zirconium-diamond interfaces
Contributors: P.K. Baumann, S.P. Bozeman, B.L. Ward, and Robert J. Nemanich
ABSTRACT
Thin Zr films were deposited on natural single crystal diamond (100) substrates by e-beam evaporation in ultra-high vacuum (UHV). Before metal deposition the surfaces were cleaned by UHV anneals at either 500 °C or 1150 °C. Following either one of these treatments a positive electron affinity was determined by means of UV photoemission spectroscopy (UPS). Depositing 2 angstroms of Zr induced a NEA on both surfaces. Field emission current - voltage measurements resulted in a threshold field (for a current of 0.1 μA) of 79 V/μm for positive electron affinity diamond surfaces and values as low as 20 V/μm for Zr on diamond.
Publisher: Materials Research Society Symposium Proceedings,
Volume: 423,
143-148 ||
Published:
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